Toshiba has partnered with SK hynix to jointly develop Nano Imprint Lithography (NIL) technology for use in Toshiba’s semiconductor manufacturing process.
Engineers from the two companies will start development of basic technologies for the process at Toshiba’s Yokohama Complex in Yokohama, Japan in April this year, targeting practical use in 2017. The agreement builds on an MOU that the companies signed in December last year. In the past Toshiba has worked with several equipment and materials…
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